Jisheng PAN

Doctor of Engineering

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(3) Jisheng Pan, Qiusheng Yan, Weihua Li. double-sided polishing device and method having polishing pad with stiffness controlled by dynamic cluster magnetic field[P]. PCT/CN2017/070456, 2017.12.14

Release time:2021-03-07 Hits:

Service Invention or Not:no

Pre One:(2) Jisheng Pan; Qiusheng Yan and Weihua Li. Double-face polishing device and method capable of controlling rigidity of polishing pad through cluster dynamic magnetic field[P]. US15555073. 2018.08.31Next One:(4) Jisheng Pan, Qiusheng Yan, Weiqiang Gao, Peng Yu. self-sharpening polishing device in dynamic magnetic field for magnetorheological flexible polishing pad and polishing method therefor[P]. PCT/CN2016/072318, 2017.05.26

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